Plasma etching apparatus, plasma etching method, and semiconductor device fabrication method including the plasma etching method

Disclosed are plasma etching apparatuses, plasma etching methods, and semiconductor device fabrication methods. The plasma etching apparatus comprises a chamber, an electrostatic chuck in a lower portion of the chamber, a radio-frequency power supply that has a connection with the electrostatic chuc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Choi, Myungsun, Shim, Seungbo, Ann, Sungjun, Kim, Kyuho, Kim, Nam Kyun, Sung, Dougyong
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!