Method, system and computer program product for 3D-NAND CDSEM metrology

Method, system and computer program product for 3D-NAND CDSEM metrology

A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Vereschagin, Vadim, Meir, Roi, Noifeld, Efrat, Kris, Roman, Miroku, Hiroshi, Levin, Sahar, Klebanov, Grigory, Yoshizawa, Taku, Duvdevani-Bar, Sharon, Saha, Kasturi, Schwarzband, Ishai, Levi, Shimon
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.