Polymer and composition for forming an anti-reflective film and method of manufacturing an integrated circuit device using the anti-reflective film

A polymer having a repeating unit represented by Formula 1:wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated...

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Hauptverfasser: Hong, Sukkoo, Kang, Miyeong, Kim, Hyunjin, Kim, Hyereun, Lee, Jungyoul, Roh, Hyojung, Park, Jongkyoung, Kim, Jihyun
Format: Patent
Sprache:eng
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Zusammenfassung:A polymer having a repeating unit represented by Formula 1:wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms, wherein at least one of R1, R2, and R3 is a hydrocarbon group substituted with a fluorine atom. R4 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms. R5 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms.