Nano protrusion surface forming method and base material having nano protrusion surface formed by method

The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer...

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Bibliographische Detailangaben
Hauptverfasser: Kim, Yun Hwan, Lee, Ji Young, Seo, Jae Hyung, Lee, Sang Ro, Kim, Ki Hun
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer including protrusions having a width of several tens of nm to several μm, by a wet etching process using an acid solution without using a nano-mask.