Atmospheric-pressure plasma processing apparatus and method using argon plasma gas

An atmospheric pressure plasma processing apparatus and method employing argon as a plasma gas in the absence of helium, including nanosecond pulse-powered electrodes having planar surfaces, and grounded electrodes having planar surfaces parallel to the surfaces of the powered electrodes and spaced-...

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Bibliographische Detailangaben
Hauptverfasser: Cornelius, Carrie E, Tyner, David W, Cross, Joseph H, Roche, Gregory A
Format: Patent
Sprache:eng
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Zusammenfassung:An atmospheric pressure plasma processing apparatus and method employing argon as a plasma gas in the absence of helium, including nanosecond pulse-powered electrodes having planar surfaces, and grounded electrodes having planar surfaces parallel to the surfaces of the powered electrodes and spaced-apart a chosen distance therefrom, forming plasma regions, are described. The absence of helium from the plasma discharge has been found not to affect the quality of the resulting plasma-polymerized coatings of the processed substrates.