Microfluidic device and method for manufacturing a microfluidic device

A method for manufacturing a microfluidic device includes providing a first substrate having a first surface and a second surface located opposite the first surface. An etching mask is produced on the first surface, the etching mask having an opening. A recess is produced by etching in the first sur...

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Bibliographische Detailangaben
Hauptverfasser:	Bauert, Tobias, Grogg, Daniel
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	A method for manufacturing a microfluidic device includes providing a first substrate having a first surface and a second surface located opposite the first surface. An etching mask is produced on the first surface, the etching mask having an opening. A recess is produced by etching in the first surface in a region of the opening. An electrically conductive material is deposited on the etching mask and/or a layer covering the etching mask, and on a region of a bottom of the recess below the opening.