EMC control for pulsed high voltage source of a plasma device for medical treatment

The invention relates to a high voltage source to be coupled to an electrode arrangement for a dielectric barrier discharge plasma treatment. It has a high voltage transformer device including a primary and secondary inductor coupled via a magnetic circuit. A feed circuit including a power capacitor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Zeper, Wouter Bastiaan, Smits, Paulien, de Vries, Douwe Henrik
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a high voltage source to be coupled to an electrode arrangement for a dielectric barrier discharge plasma treatment. It has a high voltage transformer device including a primary and secondary inductor coupled via a magnetic circuit. A feed circuit including a power capacitor, the power capacitor coupled with the primary inductor and a first controllable conductor in series. A controller is arranged to intermittent switching of the first controllable conductor in on- and off-states; and a second controllable conductor is coupled in parallel to the primary windings; the controller arranged to switch the second controllable conductor to a conducting on-state when the first controllable conductor is in an on-state to short the resonating current in the primary inductor.