Resonant process monitor

Embodiments described herein include a resonant process monitor and methods of forming such a resonant process monitor. In an embodiment, the resonant process monitor includes a frame that has a first opening and a second opening. In an embodiment, a resonant body seals the first opening of the fram...

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Bibliographische Detailangaben
Hauptverfasser: Tae, Patrick John, Pan, Yaoling, Willwerth, Michael D, Tedeschi, Leonard, Chan, Kelvin, Goel, Ashish, Kraus, Philip Allan, Lu, Chih-shun, Subramani, Anantha, Krithivasan, Vijaykumar, Mao, Shimin
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments described herein include a resonant process monitor and methods of forming such a resonant process monitor. In an embodiment, the resonant process monitor includes a frame that has a first opening and a second opening. In an embodiment, a resonant body seals the first opening of the frame. In an embodiment, a first electrode on a first surface of the resonant body contacts the frame and a second electrode is on a second surface of the resonant body. Embodiments also include a back plate that seals the second opening of the frame. In an embodiment the back plate is mechanically coupled to the frame, and the resonant body, the back plate, and interior surfaces of the frame define a cavity.