Vapor deposition mask with metal plate

A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for...

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Bibliographische Detailangaben
Hauptverfasser: Nishimura, Hiroyuki, Takekoshi, Takashi, Hirobe, Yoshinori, Obata, Katsunari, Matsumoto, Yutaka, Takeda, Toshihiko, Ushikusa, Masato
Format: Patent
Sprache:eng
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Zusammenfassung:A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.