Semiconductor device
The plurality of first control electrodes extend in a first direction in a planar view, the plurality of second control electrodes extend in a second direction in a planar view. A sum of lengths in the first direction of boundaries between the second semiconductor layer and the plurality of third se...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The plurality of first control electrodes extend in a first direction in a planar view, the plurality of second control electrodes extend in a second direction in a planar view. A sum of lengths in the first direction of boundaries between the second semiconductor layer and the plurality of third semiconductor layers on a surface of the semiconductor substrate which faces the plurality of first control electrodes is set as a first gate total width. A sum of lengths in the second direction of boundaries between the fourth semiconductor layer and the plurality of fifth semiconductor layers on a surface of the semiconductor substrate which faces the plurality of second control electrodes is set as a second gate total width. A gate width ratio obtained by dividing the second gate total width by the first gate total width is equal to or higher than 1.0. |
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