Semiconductor device having via protective layer

A semiconductor device is disclosed. The semiconductor device includes a via passivation layer disposed on an inactive surface of a substrate, a through-electrode vertically penetrating the substrate and the via passivation layer, a concave portion formed in the top surface of the via passivation la...

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Bibliographische Detailangaben
Hauptverfasser: Jin, Jeonggi, Song, Solji, Chun, Jinho, An, Jinho, Choi, Juil, Park, Jumyong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device is disclosed. The semiconductor device includes a via passivation layer disposed on an inactive surface of a substrate, a through-electrode vertically penetrating the substrate and the via passivation layer, a concave portion formed in the top surface of the via passivation layer and disposed adjacent to the through-electrode, and a via protective layer coplanar with the via passivation layer and the through-electrode and to fill the concave portion. In a horizontal cross-sectional view, the via protective layer has a band shape surrounding the through-electrode.