Defect prediction

A method including obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based o...

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Bibliographische Detailangaben
Hauptverfasser: Kea, Marc Jurian, Yudhistira, Yasri, La Fontaine, Bruno, Genin, Maxime Philippe Frederic, Cheong, Lin Lee
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method including obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based on the verified values and the computed values; and obtaining an attribute of a distribution of the residue based on the values of the residue. Also disclosed herein are methods of computing a probability of defects on a substrate produced by the device manufacturing process, and of obtaining an attribute of a distribution of the residue of a non-probabilistic model.