Non-volatile memory elements with filament confinement

Structures for a non-volatile memory and methods of forming and using such structures. A resistive memory element includes a first electrode, a second electrode, and a switching layer arranged between the first electrode and the second electrode. A transistor includes a drain coupled with the second...

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Bibliographische Detailangaben
Hauptverfasser: Toh, Eng Huat, Tan, Shyue Seng, Liu, Bin, Loy, Desmond Jia Jun
Format: Patent
Sprache:eng
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Zusammenfassung:Structures for a non-volatile memory and methods of forming and using such structures. A resistive memory element includes a first electrode, a second electrode, and a switching layer arranged between the first electrode and the second electrode. A transistor includes a drain coupled with the second electrode. The switching layer has a top surface, and the first electrode is arranged on a first portion of the top surface of the switching layer. A hardmask, which is composed of a dielectric material, is arranged on a second portion of the top surface of the switching layer.