Optical film structures and articles for hidden displays and display devices

An article is described herein that includes: a translucent substrate comprising opposing major surfaces; and an optical film structure disposed on a first major surface of the substrate, the optical film structure comprising an outer surface and a plurality of periods such that each period comprises an alternating low refractive index layer and high refractive index layer. The article exhibits a hardness of 10 GPa or greater measured at an indentation depth of about 100 nm by a Berkovich Indenter Hardness Test. Further, the article exhibits a single side average photopic light reflectance of at least 50% of non-polarized light as measured at the outer surface from near-normal incidence to an incident angle of 60 degrees over a portion of at least 10 nm within the visible spectrum. In addition, each low refractive index layer comprises SiO2 or doped-SiO2 and each high refractive index layer comprises AlOxNy, SiOxNy, SiuAlvOxNy, SiNx or ZrO2.