Capacitively coupled plasma etching apparatus

Disclosed is a capacitively coupled plasma etching apparatus, wherein a lower electrode is fixed to a lower end of an electrically conductive supporting rod, a telescope electrically conductive part is fixed to the lower end of the electrically conductive supporting rod, wherein the retractable elec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Huang, Yunwen, Wu, Lei, Zhao, Jinlong, Liang, Jie, Ni, Tuqiang
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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