Local metallization for semiconductor substrates using a laser beam

Local metallization of semiconductor substrates using a laser beam, and the resulting structures, e.g., micro-electronic devices, semiconductor substrates and/or solar cells, are described. For example, a solar cell includes a substrate and a plurality of semiconductor regions disposed in or above t...

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Bibliographische Detailangaben
Hauptverfasser: Hsia, Benjamin I, Barkhouse, David Aaron R, Gorny, Lee, Lu, Pei Hsuan
Format: Patent
Sprache:eng
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Zusammenfassung:Local metallization of semiconductor substrates using a laser beam, and the resulting structures, e.g., micro-electronic devices, semiconductor substrates and/or solar cells, are described. For example, a solar cell includes a substrate and a plurality of semiconductor regions disposed in or above the substrate. A plurality of conductive contact structures is electrically connected to the plurality of semiconductor regions. Each conductive contact structure includes a locally deposited metal portion disposed in contact with a corresponding a semiconductor region.