Method for forming circuits using seed layer and etchant composition for selective etching of seed layer

The present invention relates to a method for forming a circuit using a seed layer. The method for forming a circuit using a seed layer according to the present invention, may realize a fine pitch, increase the adhesion of the circuit, and prevent the migration phenomenon.

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Bibliographische Detailangaben
Hauptverfasser: Moon, Jung Yoon, Seong, Hyeon-Jun, Moon, Byung Woong, Kim, Jae Rin, Kim, Su Han, Chung, Kwang-Choon
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The present invention relates to a method for forming a circuit using a seed layer. The method for forming a circuit using a seed layer according to the present invention, may realize a fine pitch, increase the adhesion of the circuit, and prevent the migration phenomenon.