Gas showerhead, manufacturing method, and plasma apparatus including the gas showerhead
Disclosed are a gas showerhead, a method of manufacturing the same, and a plasma apparatus provided with the gas showerhead. The gas showerhead comprises a back plate and a gas distribution plate, the gas distribution plate including a plurality of annular gas distribution regions with the center of...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed are a gas showerhead, a method of manufacturing the same, and a plasma apparatus provided with the gas showerhead. The gas showerhead comprises a back plate and a gas distribution plate, the gas distribution plate including a plurality of annular gas distribution regions with the center of the gas distribution plate as their center; on each annular gas distribution region are provided a plurality of gas through-holes penetrating through the gas inlet face and the gas outlet face, the gas through-holes at least including a plurality of first gas through-holes inclined at a certain angle, and the gas through-holes further include a plurality of second gas through-holes, the second gas through-holes being parallel to the central axis or having a radial inclination direction different from the first gas through-holes; and in the same annular gas distribution region, gas flowing out of the first gas through-holes and gas flowing out of the second gas through-holes are kept away from each other. |
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