Determining a characteristic of a substrate

A method is described in which a reflection is obtained of a laser light pattern reflected from a substrate. A reflection of diffuse light may be obtained from the substrate. A first parameter may be determined, relating to the substrate from the reflected laser light pattern. A second parameter may...

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Bibliographische Detailangaben
Hauptverfasser: Coll Sicluna, Joan Jordi, Morovic, Peter, Casaldaliga Albisu, Marcos, Gomez Minano, Hector, Morovic, Jan
Format: Patent
Sprache:eng
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Zusammenfassung:A method is described in which a reflection is obtained of a laser light pattern reflected from a substrate. A reflection of diffuse light may be obtained from the substrate. A first parameter may be determined, relating to the substrate from the reflected laser light pattern. A second parameter may be determined, relating to the substrate from the reflected diffuse light and a characteristic of the substrate may be determined from the first and second parameters. A print apparatus and a machine-readable medium are also disclosed.