Compensation magnetic field generator for a magnetic field measurement system

A magnetic field generator includes a first planar substrate, a second planar substrate positioned opposite to the first planar substrate and separated from the first planar substrate by a gap, a first wiring set on the first planar substrate, a second wiring set on the second planar substrate, and...

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Bibliographische Detailangaben
Hauptverfasser:	Decker, Dakota Blue, Leung, Jerry, Seidman, Scott Jeremy, Ledbetter, Micah, Siepser, Benjamin, Gormley, Jeffery Kang, Alford, Jamu, Mohseni, Hooman, Homan, Scott Michael, Lasser, Teague, Garber, Stephen, Pratt, Ethan, Henninger, Michael
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS DIAGNOSIS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY HUMAN NECESSITIES HYGIENE IDENTIFICATION INDUCTANCES MAGNETS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES MEDICAL OR VETERINARY SCIENCE PHYSICS PRINTED CIRCUITS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SURGERY TESTING TRANSFORMERS
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Beschreibung
Zusammenfassung:	A magnetic field generator includes a first planar substrate, a second planar substrate positioned opposite to the first planar substrate and separated from the first planar substrate by a gap, a first wiring set on the first planar substrate, a second wiring set on the second planar substrate, and one or more interconnects between the first planar substrate and the second planar substrate. The one or more interconnects electrically connect the first wiring set with the second wiring set to form a continuous electrical path. The continuous electrical path forms a conductive winding configured to generate, when supplied with a drive current, a first component of a compensation magnetic field configured to actively shield a magnetic field sensing region located in the gap from ambient background magnetic fields along a first axis that is substantially parallel to the first planar substrate and the second planar substrate.