Process for cleaning optical elements for the ultraviolet wavelength range

Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: -supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fracti...

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Bibliographische Detailangaben
Hauptverfasser:	Rogalsky, Olaf, Forcht, Konstantin, Ament, Irene
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: -supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fraction of below 5 ppm, preferably below 1 ppm, particularly preferably below 0.2 ppm. To this end, an optical system (1) includes a housing (122), a supply line (161) of activated hydrogen, a supply line (162) of inert gas having an H2O volume fraction of below 5 ppm and a discharge line (163) for pumping gas out of the housing.