Memory devices and methods of forming memory devices

A memory device may be provided, including a base layer; an insulating layer arranged over the base layer, where the insulating layer may include a recess having opposing side walls; a first electrode arranged along the opposing side walls of the recess; a switching element arranged along the first...

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Bibliographische Detailangaben
Hauptverfasser: Hsieh, Curtis Chun-I, Yi, Wanbing, Jiang, Yi, Kang, Kai, Tan, Juan Boon, Hsu, Wei-Hui
Format: Patent
Sprache:eng
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Zusammenfassung:A memory device may be provided, including a base layer; an insulating layer arranged over the base layer, where the insulating layer may include a recess having opposing side walls; a first electrode arranged along the opposing side walls of the recess; a switching element arranged along the first electrode; a second electrode arranged along the switching element; and a capping layer arranged over the recess, where the capping layer may at least partially overlap the first electrode, the switching element and the second electrode.