SiC epitaxial wafer, semiconductor device, and power converter

A SiC epitaxial wafer includes a SiC substrate and a SiC epitaxial layer disposed on the SiC substrate. The SiC epitaxial layer includes a high carrier concentration layer and two low carrier concentration layers having lower carrier concentration than the high carrier concentration layer, and being...

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Bibliographische Detailangaben
Hauptverfasser: Sakai, Masashi, Mitani, Yoichiro
Format: Patent
Sprache:eng
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Zusammenfassung:A SiC epitaxial wafer includes a SiC substrate and a SiC epitaxial layer disposed on the SiC substrate. The SiC epitaxial layer includes a high carrier concentration layer and two low carrier concentration layers having lower carrier concentration than the high carrier concentration layer, and being in contact with a top surface and a bottom surface of the high carrier concentration layer to sandwich the high carrier concentration layer. A difference in carrier concentration between the high carrier concentration layer and the low carrier concentration layers is 5×1014/cm3 or more and 2×1016/cm3 or less.