X-ray analysis apparatus

Provided is an X-ray analysis apparatus including: a goniometer including an incident-side arm extending in a first direction, a fixing portion, and a receiving-side arm; an X-ray source portion, which is arranged on the incident-side arm and generates an X-ray source extending in a second direction...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Osakabe, Takeshi, Omoto, Kazuki, Ozawa, Tetsuya
Format:	Patent
Sprache:	eng
Schlagworte:	GAMMA RAY OR X-RAY MICROSCOPES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES IRRADIATION DEVICES MEASURING NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TESTING
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Beschreibung
Zusammenfassung:	Provided is an X-ray analysis apparatus including: a goniometer including an incident-side arm extending in a first direction, a fixing portion, and a receiving-side arm; an X-ray source portion, which is arranged on the incident-side arm and generates an X-ray source extending in a second direction, which crosses the first direction; a support base, which is arranged on the fixing portion, and is configured to support a sample; a parallel slit, which is arranged on the fixing portion, and is configured to limit a line width along the second direction of the X-ray source generated by the X-ray source portion; and a detector, which is arranged on the receiving-side arm, and is configured to detect a scattered X-ray generated by the sample.