Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method

Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method

A substrate processing module includes a process chamber configured to perform a treatment process on a substrate; a transfer chamber provided on a first side of the process chamber, the substrate being transferred between the process chamber and the transfer chamber; an optical emission spectroscop...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Mun, Jeongil, Sun, Jongwoo, Lee, Hyung Joo, Kim, Kyeonghun
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
COLORIMETRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
TESTING
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Beschreibung
Zusammenfassung:A substrate processing module includes a process chamber configured to perform a treatment process on a substrate; a transfer chamber provided on a first side of the process chamber, the substrate being transferred between the process chamber and the transfer chamber; an optical emission spectroscopy (OES) system provided on a second side of the process chamber and configured to monitor the process chamber; and a reference light source disposed in the transfer chamber and configured to emit a reference light to calibrate the OES system.