Substrate supporting unit and film forming device having the substrate supporting unit

A substrate supporting unit is provided. The substrate supporting unit possesses a shaft, a first heater, and a stage. The first heater is located in the shaft and is configured to heat an upper portion of the shaft. The stage is located over the shaft and includes a first plate, a second plate over...

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Bibliographische Detailangaben
Hauptverfasser: Takahara, Go, Hanamachi, Toshihiko, Tatsumi, Arata
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate supporting unit is provided. The substrate supporting unit possesses a shaft, a first heater, and a stage. The first heater is located in the shaft and is configured to heat an upper portion of the shaft. The stage is located over the shaft and includes a first plate, a second plate over the first plate, and a second heater between the first plate and the second plate.