Detection of crystallographic properties in aerospace components

Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An a...

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Bibliographische Detailangaben
Hauptverfasser: Cernatescu, Iuliana, Seetharaman, Venkatarama K, Furrer, David U
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.