Copolymer having carbosiloxane dendrimer structure and acidic group, composition containing same, and cosmetic

A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dend...

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Bibliographische Detailangaben
Hauptverfasser:	Souda, Tatsuo, Hori, Seiji, Kikunaga, Sayuri
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS HUMAN NECESSITIES HYGIENE MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MEDICAL OR VETERINARY SCIENCE METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.