Aromatic resins for underlayers

Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

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Bibliographische Detailangaben
Hauptverfasser:	Yamada, Shintaro, Kaitz, Joshua A, Cameron, James F, Liu, Sheng, Coley, Suzanne M, Zhang, Keren, Cui, Li
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.