Method of operating a semiconductor device having a desaturation channel structure
A method is provided for operating a semiconductor device which includes an IGBT having a desaturation semiconductor structure connected to a first electrode terminal and a gate electrode terminal for controlling a desaturation channel. The method includes: applying a first gate voltage to the gate...
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creator | Laven, Johannes Schulze, Hans-Joachim |
description | A method is provided for operating a semiconductor device which includes an IGBT having a desaturation semiconductor structure connected to a first electrode terminal and a gate electrode terminal for controlling a desaturation channel. The method includes: applying a first gate voltage to the gate electrode terminal so that current flows through the IGBT between the first electrode terminal and a second electrode terminal and current flow through the desaturation channel is substantially blocked; applying a different second gate voltage to the gate electrode terminal so that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal; and applying a different third gate voltage to the gate electrode terminal so that current flow through the IGBT between the first and second electrode terminals is substantially blocked. |
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The method includes: applying a first gate voltage to the gate electrode terminal so that current flows through the IGBT between the first electrode terminal and a second electrode terminal and current flow through the desaturation channel is substantially blocked; applying a different second gate voltage to the gate electrode terminal so that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal; and applying a different third gate voltage to the gate electrode terminal so that current flow through the IGBT between the first and second electrode terminals is substantially blocked.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BASIC ELECTRONIC CIRCUITRY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PULSE TECHNIQUE ; SEMICONDUCTOR DEVICES</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210914&DB=EPODOC&CC=US&NR=11121242B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210914&DB=EPODOC&CC=US&NR=11121242B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Laven, Johannes</creatorcontrib><creatorcontrib>Schulze, Hans-Joachim</creatorcontrib><title>Method of operating a semiconductor device having a desaturation channel structure</title><description>A method is provided for operating a semiconductor device which includes an IGBT having a desaturation semiconductor structure connected to a first electrode terminal and a gate electrode terminal for controlling a desaturation channel. The method includes: applying a first gate voltage to the gate electrode terminal so that current flows through the IGBT between the first electrode terminal and a second electrode terminal and current flow through the desaturation channel is substantially blocked; applying a different second gate voltage to the gate electrode terminal so that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal; and applying a different third gate voltage to the gate electrode terminal so that current flow through the IGBT between the first and second electrode terminals is substantially blocked.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BASIC ELECTRONIC CIRCUITRY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PULSE TECHNIQUE</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrsNAjEQRVEnBAjoYSiAwIYKQItISPjEq5H9FltaPJY_Wz8gKIDoBvfM1eWM6sWRDCQJmWuID2IqeAYr0TVbJZPDFCzI8_S9DoVr-2CJZD3HiJFKzW_dMpZqNvBYsPp1odbH7nY4bZCkR0lsEVH7-1VrbbTZmb3Z_mNeQyc4kw</recordid><startdate>20210914</startdate><enddate>20210914</enddate><creator>Laven, Johannes</creator><creator>Schulze, Hans-Joachim</creator><scope>EVB</scope></search><sort><creationdate>20210914</creationdate><title>Method of operating a semiconductor device having a desaturation channel structure</title><author>Laven, Johannes ; Schulze, Hans-Joachim</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11121242B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BASIC ELECTRONIC CIRCUITRY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PULSE TECHNIQUE</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Laven, Johannes</creatorcontrib><creatorcontrib>Schulze, Hans-Joachim</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Laven, Johannes</au><au>Schulze, Hans-Joachim</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of operating a semiconductor device having a desaturation channel structure</title><date>2021-09-14</date><risdate>2021</risdate><abstract>A method is provided for operating a semiconductor device which includes an IGBT having a desaturation semiconductor structure connected to a first electrode terminal and a gate electrode terminal for controlling a desaturation channel. The method includes: applying a first gate voltage to the gate electrode terminal so that current flows through the IGBT between the first electrode terminal and a second electrode terminal and current flow through the desaturation channel is substantially blocked; applying a different second gate voltage to the gate electrode terminal so that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal; and applying a different third gate voltage to the gate electrode terminal so that current flow through the IGBT between the first and second electrode terminals is substantially blocked.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS BASIC ELECTRONIC CIRCUITRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PULSE TECHNIQUE SEMICONDUCTOR DEVICES |
title | Method of operating a semiconductor device having a desaturation channel structure |
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