Substrate processing system

A substrate processing system includes a first processing block, a second processing block, and a reversing device. The first processing block includes a first processing unit configured to perform a process on a substrate with a first surface of the substrate facing upward, and a first transfer dev...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	Amano, Yoshifumi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A substrate processing system includes a first processing block, a second processing block, and a reversing device. The first processing block includes a first processing unit configured to perform a process on a substrate with a first surface of the substrate facing upward, and a first transfer device configured to carry the substrate into/from the first processing unit. The second processing block includes a second processing unit configured to perform a process on the substrate with a second surface of the substrate, which is opposite to the first surface, facing upward, and a second transfer device configured to carry the substrate into/from the second processing unit. The reversing device is provided on a transfer path of the substrate from the first processing block to the second processing block, and is configured to reverse the substrate.