Semiconductor memory device

A semiconductor memory device includes a substrate, a first active pattern on the substrate, a gate electrode intersecting a channel region of the first active pattern, a first insulating layer covering the first active pattern and the gate electrode, a contact penetrating the first insulating layer...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Song, Woo Bin, Cantoro, Mirco, Lee, Sang Woo, Kim, Hei Seung, Cho, Min Hee, Park, Hyunmog, Hwang, Beomyong
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A semiconductor memory device includes a substrate, a first active pattern on the substrate, a gate electrode intersecting a channel region of the first active pattern, a first insulating layer covering the first active pattern and the gate electrode, a contact penetrating the first insulating layer so as to be electrically connected to a first source/drain region of the first active pattern, and a second active pattern on the first insulating layer. A channel region of the second active pattern vertically overlaps with the contact.