Pellicle attachment apparatus

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Janssen, Maurice Leonardus Johannes, Jansen, Maarten Mathijs Marinus, Leenders, Martinus Hendrikus Antonius, Middel, Geert, Van Den Bosch, Gerrit, Kerstens, Roland Jacobus Johannes, Van Lievenoogen, Anne Johannes Wilhelmus, Kruizinga, Matthias, Kramer, Ronald Harm Gunther, Dekkers, Jeroen, Loopstra, Erik Roelof, Kester, Martinus Jozef Maria, Bruijn, Marc, Janssen, Paul, Van Der Meulen, Frits, Van Loo, Jérôme François Sylvain Virgile, Brouns, Derk Servatius Gertruda, Theuerzeit, Frank Johannes Christiaan, De Klerk, Angelo Cesar Peter, Reijnders, Silvester Matheus, Dings, Jacobus Maria, Lansbergen, Robert Gabriël Maria, Verbrugge, Beatrijs Louise Marie-Joseph Katrien, Azeredo Lima, Jorge Manuel, Loos, Michel
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.