Apparatus and method for waste gas scrubbing

A device for waste gas scrubbing in a urea plant may be configured such that a waste gas passes along a transportation direction in the duct. The duct may include a first region for removing urea dust particles from the waste gas and a second region for removing chemical compounds from the waste gas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Buss, Stephan, Schmitz, Martina, Gehrke, Helmut
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMISTRY METALLURGY ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	A device for waste gas scrubbing in a urea plant may be configured such that a waste gas passes along a transportation direction in the duct. The duct may include a first region for removing urea dust particles from the waste gas and a second region for removing chemical compounds from the waste gas, which can be integrated by an acid-base reaction into an aqueous liquid phase. A cross-sectional area of the duct extending perpendicular to the transportation direction in the second region may be greater than a cross-sectional area extending perpendicular to the transportation direction in the first region. Further, the device may be configured such that the duct extends horizontally at least in sections and/or the transportation direction of the waste gas through the duct extends horizontally in an installed state.