Method of fabricating a semiconductor device using an adhesive layer

A method of fabricating a semiconductor device is provided in which an adhesive layer is disposed on a first surface of a first semiconductor substrate. A carrier substrate is provided on the first surface of the first semiconductor substrate, and the carrier substrate is separated from a surface of...

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Bibliographische Detailangaben
Hauptverfasser: Lim, Jun-su, Cho, Sungil, Lee, Kyung-Hak, Park, Jaeyong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of fabricating a semiconductor device is provided in which an adhesive layer is disposed on a first surface of a first semiconductor substrate. A carrier substrate is provided on the first surface of the first semiconductor substrate, and the carrier substrate is separated from a surface of the adhesive layer while the adhesive layer is still attached to the first surface of the first semiconductor substrate.