Substrate processing apparatus and apparatus for manufacturing integrated circuit device

A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate...

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Bibliographische Detailangaben
Hauptverfasser: Cho, Yong-Jhin, Gil, Yeon-Jin, Lee, Kun-Tack, Kim, Young-Hoo, Park, Sang-Jine, Jeong, Ji-Hoon, Ko, Yong-Sun, Cho, Byung-Kwon
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.