Lithographic method

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurali...

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Bibliographische Detailangaben
Hauptverfasser:	Menchtchikov, Boris, Erdamar, Ahmet Koray, Van't Westeinde, Maaike, Bijnen, Franciscus Godefridus Casper, Roelofs, Willem Seine Christian, Rijpstra, Manouk, Tinnemans, Patricius Aloysius Jacobus, Cekli, Hakki Ergün, Megens, Henricus Johannes Lambertus, Raghunathan, Sudharshanan, Hulsebos, Edo Maria, Kou, Weitian, Goosen, Maikel Robert, Van De Ven, Wendy Johanna Martina, Yagubizade, Hadi, Vu, Tran Thanh Thuy, Cox, Matthijs, Brinkhof, Ralph, Verhees, Loek Johannes Petrus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.