Low energy e-beam contact printing lithography

A method comprising contact-free positioning a template mask wafer having a template device pattern relative to a predetermined surface area section of a device pattern wafer. The template mask wafer includes a semitransparent layer. The method includes contact-free aligning one or more mask alignment marks of the template mask wafer with one or more alignment marks of the device pattern wafer and contacting the mask wafer on the device pattern wafer. The method includes transferring a template device pattern of the template mask wafer onto the predetermined surface area section of the device pattern wafer using an electron beam while heat conduction is distributed throughout the mask wafer to maintain a low temperature rise in the mask wafer during the transferring. A system is also provided.