Optical system for microlithography

A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catal...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	Grossmann, Jan
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.