Liquid supplying device and liquid supplying method
The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Toyomasu, Fujihiko Kunisawa, Junji |
| description | The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10926301B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10926301B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10926301B23</originalsourceid><addsrcrecordid>eNrjZDD2ySwszUxRKC4tKMipzMxLV0hJLctMTlVIzEtRyEGXy00tychP4WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhgaWRmbGBoZORsbEqAEAKPQs5A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Liquid supplying device and liquid supplying method</title><source>esp@cenet</source><creator>Toyomasu, Fujihiko ; Kunisawa, Junji</creator><creatorcontrib>Toyomasu, Fujihiko ; Kunisawa, Junji</creatorcontrib><description>The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device.</description><language>eng</language><subject>ACTUATING-FLOATS ; BASIC ELECTRIC ELEMENTS ; BLASTING ; CLEANING ; CLEANING IN GENERAL ; COCKS ; CONTROLLING ; DEVICES FOR VENTING OR AERATING ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ENGINEERING ELEMENTS AND UNITS ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; GRINDING ; HEATING ; LIGHTING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PHYSICS ; POLISHING ; PREVENTION OF FOULING IN GENERAL ; REGULATING ; SEMICONDUCTOR DEVICES ; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES ; TAPS ; THERMAL INSULATION IN GENERAL ; TRANSPORTING ; VALVES ; WEAPONS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210223&DB=EPODOC&CC=US&NR=10926301B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210223&DB=EPODOC&CC=US&NR=10926301B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Toyomasu, Fujihiko</creatorcontrib><creatorcontrib>Kunisawa, Junji</creatorcontrib><title>Liquid supplying device and liquid supplying method</title><description>The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device.</description><subject>ACTUATING-FLOATS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>COCKS</subject><subject>CONTROLLING</subject><subject>DEVICES FOR VENTING OR AERATING</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>GRINDING</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MECHANICAL ENGINEERING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POLISHING</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><subject>TAPS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>TRANSPORTING</subject><subject>VALVES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD2ySwszUxRKC4tKMipzMxLV0hJLctMTlVIzEtRyEGXy00tychP4WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhgaWRmbGBoZORsbEqAEAKPQs5A</recordid><startdate>20210223</startdate><enddate>20210223</enddate><creator>Toyomasu, Fujihiko</creator><creator>Kunisawa, Junji</creator><scope>EVB</scope></search><sort><creationdate>20210223</creationdate><title>Liquid supplying device and liquid supplying method</title><author>Toyomasu, Fujihiko ; Kunisawa, Junji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10926301B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2021</creationdate><topic>ACTUATING-FLOATS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>COCKS</topic><topic>CONTROLLING</topic><topic>DEVICES FOR VENTING OR AERATING</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>GRINDING</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MECHANICAL ENGINEERING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POLISHING</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</topic><topic>TAPS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>TRANSPORTING</topic><topic>VALVES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>Toyomasu, Fujihiko</creatorcontrib><creatorcontrib>Kunisawa, Junji</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Toyomasu, Fujihiko</au><au>Kunisawa, Junji</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Liquid supplying device and liquid supplying method</title><date>2021-02-23</date><risdate>2021</risdate><abstract>The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US10926301B2 |
| source | esp@cenet |
| subjects | ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING CLEANING CLEANING IN GENERAL COCKS CONTROLLING DEVICES FOR VENTING OR AERATING DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS GRINDING HEATING LIGHTING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICS POLISHING PREVENTION OF FOULING IN GENERAL REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TAPS THERMAL INSULATION IN GENERAL TRANSPORTING VALVES WEAPONS |
| title | Liquid supplying device and liquid supplying method |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T05%3A59%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Toyomasu,%20Fujihiko&rft.date=2021-02-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10926301B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |