Liquid supplying device and liquid supplying method

The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Toyomasu, Fujihiko, Kunisawa, Junji
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING CLEANING CLEANING IN GENERAL COCKS CONTROLLING DEVICES FOR VENTING OR AERATING DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS GRINDING HEATING LIGHTING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICS POLISHING PREVENTION OF FOULING IN GENERAL REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TAPS THERMAL INSULATION IN GENERAL TRANSPORTING VALVES WEAPONS
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Beschreibung
Zusammenfassung:	The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device.