Compositions and methods for selectively etching titanium nitride

Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., cobalt, ruthenium and copper, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxid...

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Bibliographische Detailangaben
Hauptverfasser: Chen, Li-Min, Song, Lingyan, Cooper, Emanuel I, Lippy, Steven
Format: Patent
Sprache:eng
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Zusammenfassung:Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., cobalt, ruthenium and copper, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.