In-situ chamber clean end point detection systems and methods using computer vision systems

In-situ chamber clean end point detection systems and methods using computer vision systems

A system includes a camera mounted external to and adjacent to a window of a processing chamber configured to process semiconductor substrates. The window allows the camera to view a component in the processing chamber. The camera is configured to generate a video signal indicative of a status of th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lind, Gary B, Danek, Michal, Rumer, Michael, Ashtiani, Kaihan, Sawlani, Kapil, Powell, Ronald
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:A system includes a camera mounted external to and adjacent to a window of a processing chamber configured to process semiconductor substrates. The window allows the camera to view a component in the processing chamber. The camera is configured to generate a video signal indicative of a status of the component during a process being performed in the processing chamber. The system further includes a controller coupled to the processing chamber. The controller is configured to control the camera, process the video signal from the camera, determine the status of the component based on the processing of the video signal, and determine whether to terminate the process based on the status of the component.