Imprint lithography
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a positi...
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| creator | Wuister, Sander Frederik Jansen, Norbert Erwin Therenzo Renkens, Michael Jozef Mathijs Van Schothorst, Gerard Jeunink, Andre Bernardus Van Baars, Gregor Edward Hardeman, Toon De Fockert, George Arie Jan De Schiffart, Catharinus Dijksman, Johan Frederik Kruijt-Stegeman, Yvonne Wendela |
| description | An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame. |
| format | Patent |
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Renkens, Michael Jozef Mathijs ; Van Schothorst, Gerard ; Jeunink, Andre Bernardus ; Van Baars, Gregor Edward ; Hardeman, Toon ; De Fockert, George Arie Jan ; De Schiffart, Catharinus ; Dijksman, Johan Frederik ; Kruijt-Stegeman, Yvonne Wendela</creatorcontrib><description>An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Imprint lithography |
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