Imprint lithography

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a positi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Wuister, Sander Frederik, Jansen, Norbert Erwin Therenzo, Renkens, Michael Jozef Mathijs, Van Schothorst, Gerard, Jeunink, Andre Bernardus, Van Baars, Gregor Edward, Hardeman, Toon, De Fockert, George Arie Jan, De Schiffart, Catharinus, Dijksman, Johan Frederik, Kruijt-Stegeman, Yvonne Wendela
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.