Method of determining flow rate of a gas in a substrate processing system

A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flo...

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Hauptverfasser: Amikura, Norihiko, Miura, Kazuyuki, Sawada, Yohei, Nagase, Masaaki, Yamashita, Satoru, Miyoshi, Risako, Ikeda, Nobukazu, Nishino, Kouji
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creator Amikura, Norihiko
Miura, Kazuyuki
Sawada, Yohei
Nagase, Masaaki
Yamashita, Satoru
Miyoshi, Risako
Ikeda, Nobukazu
Nishino, Kouji
description A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
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subjects MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
METERING BY VOLUME
PHYSICS
TESTING
title Method of determining flow rate of a gas in a substrate processing system
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