Cleaning composition

A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system; and b) from 0.1 % to 10% by weight of the composition of a cleaning amine of Formula(I): wherein the radicals R 1 , R 2 , R 3 , R 4 and R 5 are independently selected from NH2, -H,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Delplancke, Patrick Firmin August, Hulskotter, Frank, Ludolph, Bjoern
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system; and b) from 0.1 % to 10% by weight of the composition of a cleaning amine of Formula(I): wherein the radicals R 1 , R 2 , R 3 , R 4 and R 5 are independently selected from NH2, -H, linear or branched alkyl or alkenyl having from 1 to 10 carbon atoms and n is from 0 to 3 and wherein at least one of the radicals is NH2.