Method of retrofitting a vacuum deposition chamber

The invention relates to a method of retrofitting a vacuum deposition chamber of an apparatus for coating optical substrates, the vacuum deposition chamber comprising a second resistance evaporator crucible. The method comprises installing a resistance evaporator comprising a crucible into the opera...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Maksoud, Cesar, Jacobs, Todd Lane, McCrady, Brian, Mathieu, Alain
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method of retrofitting a vacuum deposition chamber of an apparatus for coating optical substrates, the vacuum deposition chamber comprising a second resistance evaporator crucible. The method comprises installing a resistance evaporator comprising a crucible into the operational vacuum deposition chamber such that the crucible is disposed above the vacuum deposition chamber floor, and such that the second resistance evaporator crucible is closer to the vacuum deposition chamber floor than the installed crucible.