Environmental protection for wafer level and package level applications

A method includes the steps of fabricating one or more semiconductor devices on a semiconductor wafer and depositing one or more conformal organic environmental protection layers over the semiconductor wafer using a vapor deposition process. By depositing the one or more conformal organic environmen...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Ketterson, Andrew, Dry, Robert Charles, Bojkov, Christo
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method includes the steps of fabricating one or more semiconductor devices on a semiconductor wafer and depositing one or more conformal organic environmental protection layers over the semiconductor wafer using a vapor deposition process. By depositing the one or more conformal organic environmental protection layers using a vapor deposition process, thin film conformal organic environmental protection layers may be provided that offer excellent protection against water and oxygen ingress, thus increasing the ruggedness and reliability of the resulting semiconductor die.