Standby port and substrate processing apparatus having the same

Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

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Bibliographische Detailangaben
Hauptverfasser: Choi, Youngjun, Kim, Jonghan, Yu, Jin Tack, Bang, Byungsun, Jung, Buyoung, Kim, Heehwan, Jang, Young Jin, Kim, Daehun, Shin, Cheol-Yong, Park, Gui Su, Woo, Jonghyeon
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.